New Paper – Threshold reduction and yield improvement of semiconductor nanowire lasers via processing-related end-facet optimization

Arturo has had a paper accepted for publication in Nanoscale Advances, describing the impact of the transfer process on the morphology and threshold of semiconductor nanowire lasers.

While many studies have sought to improve the threshold for lasing in semiconductor nanowire lasers, the role of process has not been significantly considered. By applying a large-scale population study to this system, Arturo has used statistical tools to identify the optimal processing methods which is transferrable to a wide varity of nanowire laser structures.

(Left) Threshold as a function of processing conditions, showing the improvement arising from PDMS or ultrasound transfer. (Right) A typical laser, showing coherent emission and lasing onset.

Reference: “Threshold reduction and yield improvement of semiconductor nanowire lasers via processing-related end-facet optimization“, J. A. Alanis et al., Nanoscale Advances, 2019 (10.1039/C9NA00479C)